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Design for Manufacturability with Advanced Lithography. 1st ed. 2016
・ISBN 978-3-319-20384-3 hard EUR 49.99
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★★★
| 著者・編者 | Yu, Bei / Pan, David Z., |
|---|---|
| 出版社 | (Springer International Publishing AG, SZ) |
| 出版年月 | 2015 |
| ページ数 | 164 pp. |
| 言語 | ENG |
| ニュース番号 | ＜A05-52099＞ |
解説
This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms.