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商品詳細
Ion Implantation and Annealing Applications, Science and Technology: Contributions from IIT School, Edition 2024.
・ISBN 978-3-032-10007-8 hard EUR 229.99
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| 著者・編者 | Lerch, Wilfried / Current, Michael (eds.), |
|---|---|
| シリーズ | (Topics in Applied Physics) |
| 出版社 | (Springer Nature Switzerland AG, SZ) |
| 出版年月 | 2026 |
| ページ数 | 628 pp. |
| 言語 | ENG |
| ニュース番号 | ＜A04-96558＞ |
解説
This book compiles the insights and teachings from the 2024 IIT School lectures, offering a comprehensive look at ion implantation and annealing in semiconductor manufacturing. It covers the history of integrated circuits, common applications in CMOS technology, ion sources, radiation damage, annealing of materials like silicon (Si), silicon carbide (SiC) and gallium nitride (GaN), and advances in cluster ion beam technology. This edition, enriched by expert contributions, serves as an essential reference for students and professionals in materials science and microelectronics.