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商品詳細
Physical Design and Mask Synthesis for Directed Self-Assembly Lithography. Softcover Reprint of the Original 1st 2018 ed.
・ISBN 978-3-030-09455-3 paper EUR 99.99
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| 著者・編者 | Shim, Seongbo / Shin, Youngsoo, |
|---|---|
| シリーズ | (NanoScience and Technology) |
| 出版社 | (Springer Nature Switzerland AG, SZ) |
| 出版年月 | 2019 |
| ページ数 | 138 pp. |
| 言語 | ENG |
| ニュース番号 | ＜A02-59960＞ |
解説
This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.