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Nonthermal Plasma Chemistry and Physics.
・ISBN 978-1-4200-5916-8 hard GB£ 210.00
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| 著者・編者 | Meichsner, Jurgen / Schmidt, Martin / Schneider, Ralf / Wagner, Hans-Erich (eds.), |
|---|---|
| 出版社 | (CRC Press Inc, US) |
| 出版年月 | 2012 |
| ページ数 | 562 pp. |
| 言語 | ENG |
| ニュース番号 | ＜A00-51081＞ |
解説
In addition to introducing the basics of plasma physics, Nonthermal Plasma Chemistry and Physics is a comprehensive presentation of recent developments in the rapidly growing field of nonthermal plasma chemistry. The book offers a detailed discussion of the fundamentals of plasma chemical reactions and modeling, nonthermal plasma sources, relevant diagnostic techniques, and selected applications.
Elucidating interconnections and trends, the book focuses on basic principles and illustrations across a broad field of applications. Expert contributors address environmental aspects of plasma chemistry. The book also includes selected plasma conditions and specific applications in volume plasma chemistry and treatment of material surfaces such as plasma etching in microelectronics, chemical modification of polymer surfaces and deposition of functional thin films. Designed for students of plasma physics, Nonthermal Plasma Chemistry and Physics is a concise resource also for specialists in this and related fields of research.