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Handbook of Thin Film Process Technology: 98/1 Reactive Sputtering.
・ISBN 978-1-315-89368-6 hard GB£ 171.99
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| 著者・編者 | Glocker, David A, |
|---|---|
| 出版社 | (CRC Press, UK) |
| 出版年月 | 2017 |
| ページ数 | 90 pp. |
| 言語 | ENG |
| ニュース番号 | ＜A00-49348＞ |
解説
The Handbook of Thin Film Process Technology is a practical handbook for the thin film scientist, engineer and technician. This handbook is regularly updated with new material, and this volume is a special issue on reactive sputtering which will be of interest to a wide range of industrial and academic researchers in addition to owners of the main Handbook. Some recent developments in the reactive sputtering field are covered, including unbalanced magnetron sputtering and pulsed reactive sputtering. The articles contain a wealth of practical information relating to applications, practice and manufacturing techniques.