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Engineering Thin Films and Nanostructures with Ion Beams.
・ISBN 978-0-367-39305-2 paper GB£ 72.99
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| 著者・編者 | Knystautas, Emile (ed.), |
|---|---|
| 出版社 | (CRC Press, UK) |
| 出版年月 | 2019 |
| ページ数 | 592 pp. |
| 言語 | ENG |
| ニュース番号 | <A00-40408> |
解説
While ion-beam techniques have been used to create thin films in the semiconductor industry for several decades, these methods have been too costly for other surface treatment applications. However, as manufacturing devices become increasingly smaller, the use of a directed-energy ion beam is finding novel industrial applications that require the custom tailoring of new materials and devices, including magnetic storage devices, photonics, opto-electronics, and molecular transport. Engineering Thin Films and Nanostructures with Ion Beams offers a thorough narrative of the recent advances that make this technology relevant to current and future applications.
Featuring internationally recognized researchers, the book compiles their expertise in a multidimensional source that:
From the basics of the ion-beam modification of materials to state-of-the-art applications, Engineering Th