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Electromigration in Metals: Fundamentals to Nano-Interconnects.

Electromigration in Metals: Fundamentals to Nano-Interconnects.

・ISBN 978-1-107-03238-5 hard GB£ 82.00

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お気に入り
電子版あり 大学・学術機関向け電子ブック(eBook)ISBN 9781139505819
著者・編者Ho, Paul S. / Hu, Chao-Kun / Gall, Martin / Sukharev, Valeriy,
出版社 (Cambridge University Press, UK)
出版年月2022
ページ数430 pp.
言語ENG
ニュース番号<A00-10767>

解説

Learn to assess electromigration reliability and design more resilient chips in this comprehensive and practical resource. Beginning with fundamental physics and building to advanced methodologies, this book enables the reader to develop highly reliable on-chip wiring stacks and power grids. Through a detailed review on the role of microstructure, interfaces and processing on electromigration reliability, as well as characterisation, testing and analysis, the book follows the development of on-chip interconnects from microscale to nanoscale. Practical modeling methodologies for statistical analysis, from simple 1D approximation to complex 3D description, can be used for step-by-step development of reliable on-chip wiring stacks and industrial-grade power/ground grids. This is an ideal resource for materials scientists and reliability and chip design engineers.