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Patent Law in Greater China. 大中華圏における特許法
・ISBN 978-1-78195-483-6 hard GB£ 189.00
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★★★
| 著者・編者 | Luginbuehl, Stefan / Ganea, P. (eds.), |
|---|---|
| シリーズ | Elgar Intellectual Property Law and Practice |
| 出版社 | (E. Elgar, UK) |
| 出版年月 | 2014 |
| ページ数 | 384 pp. |
| 言語 | ENG |
| ニュース番号 | ＜614-1382 614-L553＞ |
解説
This book provides a comprehensive introduction to patent policy, law and practice in Greater China and will be a go-to book for patent practitioners who have client interests in that region.
Features:
- Introduction to Chinese patent policy.
- Detailed coverage of technology transfer and substantive patent law in China, including prerequisites for protection, exceptions and limitations.
- Practical analysis of patent law relating to 3 specific fields of invention: employee inventions, biotechnological and pharmaceutical inventions, and software inventions.
- Overview of the patent application and examination procedure, with a particular view on PCT applications.
- Insight into specific characteristics of enforcement mechanisms and jurisprudence in China, including the dual enforcement system, claim interpretation, infringement types, and invalidity procedures.
- Invaluable section on the relationship between patent and antitrust law, including practical realities in the sphere of anticompetitive licensing.
- Overviews of the patent systems of Chinese Taipei, Hong Kong SAR and Macau SAR
- Edited by two leading patent experts, and written by a team of experienced practitioners from China and from Europe, offering insight rarely brought together in a single place.
This book will be an indispensable reference work for lawyers, patent attorneys and other practitioners interested in learning whether and how to protect patents in China.
Contributors: C. Bailey, Y. Bu, J. Cao, W. Chen, D. Clark, G. Cui, C. Czychowski, M. Deng, P. Ganea, H. Goddar, N. Heide, S.-H. Lee, J. Li, Y. Li, K.-C. Liu, S. Luginbuehl, Q. Ma, T. Mak, J.B. Nordemann, T. Pattloch, O. Pfaffenzeller, B. Roth, C.D. Simoes, L. Wang, B. Weibel